In order to fabricate good quality ferroelectric thin films, PbZrxTi(1-x)O3 (PZT) and SrBi2Ta2O9 (SBT) films were fabricated on SiO2/Si(100) substrates and on Pt/Ti/SiO2/Si(100) substrates by pulsed laser excimer deposition (PLD). X-ray diffraction, Rutherford backscattering analysis, and atomic force microscopy were used to characterize the structural properties of the samples, which were post-annealed at different temperatures. The results showed that the PZT and SBT films fabricated on Pt/Ti/SiO2/Si(100) substrates and annealed at 700 degreesC exhibited optimum properties.