Previous solution of RF (radio frequency) heating problem in ICP (inductively coupled plasma) production was obtained by an analytic mode of analysis for the entire region of source chamber. In this work, antenna region is treated by an analytic technique and a numerical solution for plasma region is obtained. Since antenna region is not fully solved, computing time is significantly saved and non-uniform plasma parameters can be easily considered by adopting the numerical method in the plasma region. In this calculation, some results for solenoidal-type ICP are obtained and compared with the previous fully analytic results (Yoon et al., Phy. Rev. E55(6) (1997) 7536). Also, calculations of local field profiles and plasma impedance for non-uniform plasma are compared with each other. These results are somewhat different trend from planar case. (C) 2003 Elsevier Science B.V. All rights reserved.