The present work investigates the selective electrochemical deposition of palladium nano-structures into scratches produced through thin oxide layers covering p-Si (1 0 0) surfaces. Using an atomic force microscope equipped with a single-crystalline diamond tip scratches in the 100 nm range were produced through a 10 nm thick dry oxide layer. Pd deposition was carried out in PdCl2 (0.01 g l(-1)) + HCl (0.1 M) by cathodic potential steps. Investigation of the palladium nucleation and growth processes onto silicon surfaces is presented. Under optimized Conditions sub-100 mm palladium structures call be obtained with a very high selectivity. (C) 2003 Elsevier Ltd. All rights reserved.