Previous Article Next Article Table of Contents Journal of Materials Science Letters, Vol.22, No.13, 939-940, 2003 DOI10.1023/A:1024623804920 Export Citation Low temperature growth of homoepitaxial film on Si substrate cleaned in-situ by ECR hydrogen plasma Kim HW, Hwang WS, Lee C, Reif R Please enable JavaScript to view the comments powered by Disqus.
