Previous Article Next Article Table of Contents Journal of Materials Science Letters, Vol.22, No.14, 1039-1042, 2003 DOI10.1023/A:1024705812865 Export Citation Role of substrate temperature during diamond film growth using the newly developed time-modulated chemical vapor deposition process Ali N, Kousar Y, Fan QH, Neto VF, Gracio J Please enable JavaScript to view the comments powered by Disqus.
