Titanium diioxide, a large-band gap semiconductor and versatile photocatalyst, has been grafted into the pores of as-synthesized MCM-41 via a new precursor titanium glycolate. The products have been extensively characterized by FT-IR, powder XRD, nitrogen adsorption, TEM and HRTEM. It was found that titania was well dispersed into the silica walls via Si-O-Ti bonds and didn't damage the hexagonal structure. Compared with other titanium alkoxides, such as titanium butoxide and titanium isopropoxide, titanium-grafted in MCM-41 via titanium glycolate is more satisfactory.