화학공학소재연구정보센터
Journal of Vacuum Science & Technology B, Vol.21, No.6, 2319-2323, 2003
Thermal stability of Pd supported on single crystalline SiO2 thin films
The effect of annealing temperature on a model Pd/SiO2 catalyst has been investigated using Auger electron spectroscopy (AES) and scanning tunneling microscopy. Pd clusters on a single crystalline SiO2 thin film are not altered with respect to size or shape upon heating to 700 K; however, interdiffusion and sintering of the Pd clusters take place between 750 and 1050 K. At 1000 K, AES data imply the formation of Pd-silicide. Above 1050 K, desorption of Pd occurs concomitant with the decomposition of SiO2. (C) 2003. American Vacuum Society.