화학공학소재연구정보센터
Journal of Vacuum Science & Technology B, Vol.21, No.6, 2564-2568, 2003
Vertically aligned carbon nanotubes grown by plasma enhanced chemical vapor deposition
Plasma enhanced chemical vapor deposition, which enables growth of carbon nanotubes directly onto substrates, is potentially suitable for preparing carbon nanotubes as electron sources in field emission displays.,In this article, we report the growth of aligned carbon nanotubes by microwave plasma enhanced chemical vapor deposition and investigate the effect of various parameters on the growth. Comparison among three catalysts (Fe, Co, and Ni) revealed that Fe gives the longest carbon nanotubes, while Co gives the carbon nanotubes with the smallest diameter. The growth of the carbon nanotubes strongly depends on the treatment time in the plasma. Field emission characteristics from the carbon nanotubes grown by the microwave plasma enhanced chemical vapor deposition are also shown. (C) 2003 American Vacuum Society.