We propose and demonstrate a technique for forming nanometer-scale metal features based on evaporation onto a substrate through a stencil mask. In this work, the stencil mask is laterally translated by a piezoflexure stage, between evaporations of different metals. The metals are chosen based on their etch chemistry to allow one material to be lifted off with respect to another. In this way, sidewall features are formed with dimensions and spacings controlled by moving the translational stage, which has 1 nm resolution. (C) 2004 American Vacuum Society.