A fluoropolymer mold is introduced and used to pattern sub-100 nm features with the characteristics that cause problems in patterning with a mold. The low surface energy and inertness, stiffness, and permeable nature of the mold material make it possible to pattern without surface treatment densely populated very fine features, mixed patterns of small and large features, and features with a high aspect ratio, when the mold is used with a polymer solution for the patterning. The ultraviolet transparency of the mold material also allows for patterning with photocurable pre-polymers.