A highly computationally efficient and accurate semi-implicit numerical technique based on the concept of operator splitting (described in detail in Part I of this paper) has been used to solve the General Dynamic Equation in complex, non-isothermal reacting flows to predict aerosol dynamics and particle deposition rates. The numerically efficient algorithm has made it possible to solve the GDE in complex two-dimensional and three-dimensional simulations, hither-to not done due to the computational intensiveness. Simulations have been performed to elucidate the role of different process parameters on aerosol dynamics and particle deposition rates in idealized and commercial horizontal single wafer CVD reactors. Specifically, it has been demonstrated that the gas phase kinetics, particle formation, growth and deposition rates result in very complex aerosol size distributions in the reactor that cannot be captured with simplistic models that do not couple the GDE to the detailed flow field simulations. Guidelines for minimizing particle contamination in CVD reactors on the basis of the simulation results are presented. (C) 2003 Elsevier Ltd. All rights reserved.