Two monomers, ethylenediamine (EDA) and diaminocyclohexane (DACH), were plasma-polymerized in continuous-wave (CW) and pulse modes. The influence of different plasma parameters on the deposition rate and film composition were investigated in detail and the changes in aminofunctionalization with varying pulse parameters were examined by FTIR, ESCA, and chemical-derivatization techniques. It was shown that a varying duty cycle does not produce a considerable effect on the retention of amine groups into the film, while power and t(on) play a significant role in the polymerization process. (C) 2004 Wiley Periodicals, Inc.