The solution-precursor plasma-spray ( SPPS) process is capable of producing highly durable thermal barrier coatings. In an effort to improve the understanding of the deposition mechanisms in this novel process, a series of specific experiments, where the substrate is held stationary and the plasma torch is programmed to scan a single pass across the substrate, were conducted and the resulting deposits were carefully characterized. In addition to the deposition mechanisms identified previously in the stationary torch experiments, the deposition mechanisms of two other types of deposits, thin film and fine spherical particles, were identified in this study. The melting of inflight formed 7YSZ particles and their rapid solidification to form ultra-fine splats on the substrate was found to be the dominant deposition mechanism. The characterization of actual SPPS coatings confirmed that the various coating-deposition mechanisms identified in the model experiments occur in concert during the actual coating process. Adherent deposits (ultra-fine splats, deposits from gel-like precursor and film formed via chemical vapor deposition), unmelted particles ( spherical particles, deposits from non-decomposed precursor) and porosity were estimated to constitute similar to65, similar to19 and similar to16 vol%, of the coating, respectively. (C) 2004 Kluwer Academic Publishers.