A perspective is given of the development and use of surface analysis, primarily by Auger-electron spectroscopy (AES) and x-ray photoelectron spectroscopy (XPS), for solving scientific and technological problems. Information is presented on growth and trends in instrumental capabilities, instrumental measurements with reduced uncertainties, knowledge of surface sensitivity, and knowledge and effects of sample morphology. Available analytical resources are described for AES, XPS, and secondary-ion mass spectrometry. Finally, the role of the American Vacuum Society in stimulating improved surface analyses is discussed.