Journal of Polymer Science Part A: Polymer Chemistry, Vol.42, No.15, 3697-3707, 2004
Synthesis of alkaline-developable, photosensitive hyperbranched polyimides through the reaction of carboxylic acid dianhydrides and trisamines
Hyperbranched polyimides (HBPI)s with high glass-transition temperatures and excellent thermal stability were synthesized through the reaction of commercially available carboxylic acid dianhydrides with tris[4-(4-aminophenoxy)phenyl]ethane (TAPE). In particular, hyperbranched polyimide HBPI(TAPE-DSDA), prepared through the reaction of TAPE with 3,3',4,4'-diphenylsulfonetetracarboxylic dianhydride (DSDA), showed higher thermal stability and good solubility. Furthermore, alkaline-developable, photosensitive HBPI(TAPE-DSDA)-MA-CA was prepared through the reaction of HBPI(TAPE-DSDA) with glycidyl methacrylate with tetrabutylammonium bromide as a catalyst in N-methyl-2-pyrrolidinone (NMP) followed by the addition reaction of cis-1,2,3,6-tetrahydrophthalic anhydride with triphenylphosphine as a catalyst in NMP. The glass-transition temperatures of HBPI(TAPE-DSDA)MA-CA were greater than 300 degreesC. A resist composed of 74 wt% HBPI(TAPE-DSDA)MA-CA, 22.2 wt% trimethylpropane triacrylate, and 3.8 wt% Irgacure 907 as a photoinitiator achieved a resolution of a 55-mum line pattern and a 275-mum space pattern by UV irradiation (1000 mJ/cm(2)). (C) 2004 Wiley Periodicals, Inc.
Keywords:alkaline-developable photosensitive materials;excellent thermal stability;high glass-transition temperature;hyperbranched polyimides;hyperbranched polymers;lithography;photopolymerization;radical polymerization