Magnetron sputtering is the process of choice for the deposition of a wide range of industrially important coatings. However, current processes have inherent limitations in terms of controlling, independently, the flux and energy of particles incident at the substrate at each stage of the deposition process. Consequently, film properties may not be optimal. In order to overcome this limitation, studies are being made of an enhanced sputtering system, which incorporates a grid-less linear ion source suitable for use in a reactive gas environment. The impact of this source on the structure and properties of dielectric coatings, in comparison with films grown in a standard system, is reported here. Coatings have been characterised. in terms of their structures, optical properties and mechanical properties using a range of techniques including atomic force microscopy, X-ray diffraction, spectrophotometry, critical load scratch testing and wear testing. Results to date demonstrate that the enhanced system improves the flexibility of control of the growth parameters in a magnetron sputtering system. (C) 2003 Elsevier B.V. All rights reserved.