화학공학소재연구정보센터
Thin Solid Films, Vol.450, No.2, 329-333, 2004
Direct patterning of polymer-based photo luminescent structures with a mask
We report a simple method to directly pattern polymer-based photo luminescent material, i.e. a prepatterned mask is placed a close distance above it. The final structure is a positive replica of the lateral structures in the mask with submicrometer resolution. The comparison of luminescence efficiency before and after patterning indicates almost no degradation in optical property of the material during the experiments. The mechanism of pattern formation is also discussed. (C) 2003 Elsevier B.V. All rights reserved.