Nickel and tantalum doped carbon films have been deposited under high vacuum by KrF laser ablation at ambient temperature. A computer controlled multi-target system allows predefined sequences of laser shots on the carbon and metallic targets, respectively, and consequently a well controlled metal doping of deposited carbon film. Electrical properties of pure and metal doped carbon films have been investigated and chemical bonding and film compositions determined using X-ray photoelectron spectroscopy (XPS). Finally, doped carbon films are integrated in fabrication of RF MEMS switches. (C) 2003 Elsevier B.V All rights reserved.