Micro-optic elements were fabricated by reactive sputter deposition or high density plasma chemical vapour deposition of diamond-like carbon films upon a micromachined silicon mould. The main advantages of the deposited films were: their low temperature deposition processes, their chemical inertness, their low internal stresses and the spectral range of light transmittance. Sputter deposited films always showed good step coverage and very smooth surfaces. The chemical vapour deposited films deposited on smooth silicon surfaces were also of good quality, but when deposited upon slightly rough silicon surfaces, they resulted in even rougher films, with relatively bad step coverage. (C) 2003 Elsevier B.V. All rights reserved.