Thin carbon films were prepared from five-membered heterocyclic organic compounds [tetrahydrofuran (THF), borane-THF (B-THF), pyrrolidine (PYL), 1-3 dimethyl-2-imidazolidinone (DMI), cyclopentane (CP)] by chemical vapor deposition (CVD). The vapor generated by heating the compound was carried by flowing Ar and decomposed on a silica glass substrate to deposit carbon films at 750 to 1000degreesC. The films were studied by scanning electron microscopy (SEM), X-ray diffraction, Raman spectroscopy, and X-ray photoelectron spectroscopy (XPS). Their growth rates were determined as a function of temperature (750 to 1000degreesC) and Ar flow rate (5 to 35 ml min(-1)). The presence of pyridine- and pyrrole-type nitrogen was confirmed in the PYL- and DMI-derived carbon films. The electrical conductivity of films prepared at 800 and 900/1000degreesC was of the order of 10(3) and 10(4) S m(-1), respectively. The micro-Vicker's hardness of films prepared at 800degreesC was 2.2 - 3.6 GPa, becoming greater (3.3 - 5.2 GPa) at 1000degreesC. (C) 2004 Elsevier B.V. All rights reserved.