Journal of Vacuum Science & Technology B, Vol.22, No.6, 3202-3205, 2004
Direct metal pattern writing by VUV photodissociation
An efficient process for direct pattern writing of thin metallic films has been developed using a 121.6 nm vacuum ultraviolet source by photodissociation of metalorganic materials. The optical reflection, crystal structure, and surface morphology of photodissociated palladium thin films were studied using a spectrophotometer, x-ray diffraction, and scanning electron microscopy. A pattern of 5 mum palladium lines separated by 5 mum spaces was produced on glass substrate by contact printing lithography. (C) 2004 American Vacuum Society.