A new UV-based soft-lithographic technique for submicron patterns via thermowetting of organic-inorganic hybrid materials is described. Specifically, 300-nm scale patterns were replicated utilising this coating-free fabrication method. With thermowetting embossing nanoimprinting technique, a poly(dimethyl siloxane) (PDMS) mold with a submicron-scale relief was placed on a thermally wetted organic-inorganic hybrid material, which was then polymerized with UV light. The thermowetting embossing nanoimprinting technique can be applied universally to patternable organic-inorganic hybrid materials, such as methacrylic and vinylic organic-inorganic hybrid materials. Fabricated submicron patterns can also be applied to the nanoscale patterning, e.g., arrayed photonic band gap materials. (c) 2004 Elsevier B.V. All rights reserved.