Nitroazobenzene films have been grafted to pyrolyzed photoresist films by electrochemical reduction of the corresponding diazonium. salt in acetonitrile solution. Two component films were also prepared by electrochemically grafting methylbenzene layers to preformed NAB films. Voltammetric investigation of the films in aqueous acid medium and the measurement of film thickness using atomic force microscopy (AFM) lead to new insights into film structure. In aqueous acid solution, the azobenzene groups have no detectable electroactivity and not all nitro groups in the films can be reduced. These findings point to a compact film structure in which proton diffusion is limited. There may also be spatial inhibition of the conformational changes that accompany azobenzene reduction. For increasingly thick NAB films, the peak for reduction of the nitro groups moves to more negative potentials and the peaks become more asymmetric in shape. These changes are interpreted in terms of the dielectric properties and the rate of proton diffusion in the films. Film thickness was measured by ploughing through the film with an AFM tip. When an NAB film prepared in acetonitrile solution is reduced in aqueous acid, the film thickness decreases by more than 50%. The changes can be partially reversed by treatment in acetonitrile-electrolyte solution and hence are attributed to ion-solvent induced swelling and shrinking. Thus, the large decrease in thickness detected by AFM after treatment of the film in aqueous acid is consistent with the compact film structure revealed by electrochemistry.