Comment on "Plasma etching of high dielectric constant materials on silicon in halogen plasma chemistries" by L. Sha and J.P. Chang [J. Vac. Sci. Technol. A 22, 88 (2004)]

Stafford L; Margot J

Journal of Vacuum Science & Technology A, Vol.23, No.4, 720-721, 2005

DOI10.1116/1.1938980 Export Citation

Comment on "Plasma etching of high dielectric constant materials on silicon in halogen plasma chemistries" by L. Sha and J.P. Chang [J. Vac. Sci. Technol. A 22, 88 (2004)]

Stafford L, Margot J