Previous Article Next Article Table of Contents Journal of Materials Science, Vol.40, No.18, 5015-5016, 2005 DOI10.1007/s10853-005-1811-4 Export Citation Characteristics of Ir etching using Ar/Cl-2 inductively coupled plasmas Park SG, Kim CW, Song HY, Kim HW, Myung JH, Joo S, Park SO, Lee KM Please enable JavaScript to view the comments powered by Disqus.
