The excellent characteristics that nanoimprint lithography (NIL) shows as a two-dimensional patterning technique, such as resolution and throughput, are shared with its three-dimensional (3D) structuring version. Nevertheless, the potentialities of NIL for 3D structuring remain largely unexplored and unexploited, hindered by the difficulties in the fabrication of high quality masters with throughput suitable for practical purposes. We present a technique that allows production of stamps with Lightly controlled three-dimensional profiles in the 10 nm-100 mu m scale range. This technique consists of a sequence of lithographic steps alternated with isotropic wet etching processes performed on a quartz substrate. Scanning electron microscopy and atomic force microscopy characterization shows that 3D structures with very accurate shape control and nanometer scale surface roughness can be formed with this method. Quartz stamps have been employed in nanoimprint, hot embossing, or casting processes to shape complex plastic elements, This technique is expected to have many applications in different nanotechnology-rclated fields such as optics, nanomechanics, microfluidics, and plasmon nano-opfics. (c) 2005 American Vacauum Society.