The effects of inertia, diffusion and thermophoresis on aerosol particle deposition from a stagnation point flow onto an axisymmetric wavy wafer are examined by the coordinate transformation and the cubic spline approximation. The numerical result reveals that the deposition effect is greatly controlled by the geometric shapes of the deposition surface and has a frequency similar to that of surface geometry. When diffusion and thermophoretic effects are the dominant deposition mechanism, the deposition effect affected by the displacement of the concaves and convexes on the deposition surface becomes obvious with the increase of radius, while the general mean deposition effect remains slightly less than that of flat wafer. (c) 2005 Elsevier Ltd. All rights reserved.