Thin Solid Films, Vol.501, No.1-2, 58-60, 2006
Present status and future feasibility for industrial implementation of Cat-CVD (Hot-Wire CVD) technology
This is to review the present status and future feasibility for the industrial implementation of the Cat-CVD (Hot-Wire CVD) technology. After a brief summary of the features and advantages of the Cat-CVD method, various efforts to industrial implementation are introduced, not only for semiconductor industry, but also for other fields such as chemical or mechanical engineering, biotechnology, textile and automobile industries. It is demonstrated that the Cat-CVD technology has a much wider applicability than expected, and that it has the potential to become a key technology in various industries. (c) 2005 Published by Elsevier B.V.
Keywords:Cat-CVD;Hot-WIre CVD (HWCVD);coating films;organic EL;ULSI process;compound-semiconductor devices;semiconductor laser