화학공학소재연구정보센터
Langmuir, Vol.22, No.7, 3057-3061, 2006
Plasma-based processes for surface wettability modification
In this article, we describe a method to create rough features on silicon surfaces by reactive etching of a photoresist layer. The roughness and, consequently, the wettability of the surfaces can be modified by modifying the duration of plastma etching. Hydrophobic materials deposited oil the rough silicon surface can be modified until a superhydrophobic behavior is obtained, whereas hydrophilic materials become more hydrophilic. The elaboration technique described herein offers an inexpensive and rapid method for the creation of tunable toughness oil silicon surfaces with large areas.