In this article, we describe a simple module that can be integrated with a commercial optical aligner for nanoimprint lithography or optical lithography. The module provides a convenient low-cost technique to transform an optical aligner for microfabrication into a nanofabrication machine. This combination enables the creation of nanoscale features and alignment of multiple-layer lithographic patterns with submicron accuracy within one instrument. Imprinting of 30 nm half-pitch lines has been demonstrated by the module, as well as submicron alignment. The module has also been used to fabricate micro-and nanoscale patterns simultaneously by the combination of optical and imprint lithography. (c) 2006 American Vacuum Society.