Ultra-low pure Pt-based electrodes (0.04-0.12 mg(Pt)/cm(2)) were prepared by dual ion-beam assisted deposition (dual IBAD) method on the surface of a non-catalyzed gas diffusion layer (GDL) substrate. Film thicknesses ranged between 250 and 750 A, these are compared with a control, a conventional Pt/C (1-0 mg(Pt)(MEA)/cm(2), E-TEK). The IBAD electrode constituted a significantly different morphology, where low density Pt deposits (largely amorphous) were formed with varying depths of penetration into the gas diffusion layer, exhibiting a gradual change towards increasing crystalline character (from 250 to 750 A). Mass specific power density of 0.297 g(Pt)/kW is reported with 250 A IBAD deposit (0.04 mg(Pt)/cm(2) for a total MEA loading of 0.08 mg(Pt)/cm(2)) at 0.65 V. This is contrasted with the commercial MEA with a loading of 1 mg(Pt)(MEA)/cm(2) where mass specific power density obtained was 1.18 g(Pt)/kW (at 0.65 V), a value typical of current state of the art commercial electrodes containing Pt/C. The principal shortcoming in this effort is the area specific power density which was in the range of 0.27-0.43 W/cm(2) (for 250-750 angstrom IBAD) at 0.65 V, hence much below the automotive target value of 0.8-0.9 W/cm(2) (at 0.65 V). An attempt to mitigate these losses is reported with the use of patterning. In this context a series of patterns ranging from 45 to 80% Pt coverage were used in conjunction with a hexagonal hole geometry. Up to 30% lowering of mass transport losses were realized. (c) 2006 Elsevier Ltd. All rights reserved.