Plasma polymerized organic thin films have been deposited on Si(100), glass and metal substrates at 25 similar to 100 degrees C using thiophene and toluene precursors by plasma enhanced CVD method. In order to compare physical and electrochemical properties of the as-grown thin films, the effect of the RF (13.56 MHz) plasma power in the range of 30 similar to 100 W and the deposition temperature on the corrosion protection efficiency and optical property were mainly studied in this work. Corrosion protection efficiency (P-k), which is one of important factors for corrosion protection in the interlayer dielectrics of microelectronic devices application, provided an increasing tendency with increasing RF power. The highest P-k value of plasma polymerized toluene film (85.27% at 70 W) was higher than that of the plasma polymerized thiophene film (65.17% at 100 W). The result of contact angle measurement showed that the plasma polymerized toluene films have more hydrophobicity than that of the plasma polymerized thiophene films. (c) 2005 Elsevier B.V. All rights reserved.