Titanium films of 90 nm thickness were deposited under UHV condition at different deposition rates, ranging from 0.3 to 10.2 angstrom s(-1), at room temperature on glass and Mo substrates at two incidence angles of 8.5 degrees and 45 degrees. The samples were analyzed using XRD and AFM techniques. The grain sizes were obtained from AFM images, while the crystallite sizes and preferred orientation of the films were obtained from XRD profiles. Results show that Ti/glass films at 8.5 degrees angle of incidence show (002) preferred orientation, while at 45 degrees incidence angle, at lower deposition rates, films show an almost amorphous structure, which develops to a strong (002) preferred orientation for deposition rate of 1.6 angstrom s(-1), and again at much higher deposition rate of 10.2 angstrom s(-1) it changes to an amorphous structure. Ti/Mo films deposited at 45 degrees incidence angle showed (101) preferred orientation. (c) 2005 Elsevier B.V. All rights reserved.