Electrochemical Analysis of Potentials and Nucleation Mechanism for (Tl0.8Pb0.2Bi0.2) (Sr0.9Ba0.1)2 Ca2.2Cu3Ox Films in Dimethyl Sulfoxide (DMSO)

Young-Ha Kim; Dae-Young Jeong; Uoo-Chang Chung; Hyun Park; Ho-Hwan Chun; Won-Sub Chung

Journal of Industrial and Engineering Chemistry, Vol.13, No.2, 279-286, March, 2007

Young-Ha Kim^{1, 2}, Dae-Young Jeong², Uoo-Chang Chung¹, Hyun Park³, Ho-Hwan Chun³, and Won-Sub Chung^{1, †}

¹School of Materials Science and Engineering, Pusan National University, Busan 609-735, Korea
²Superconducting Materials Research Group, Korea Electrotechnology Research Institute, Changwon 641-600, Korea
³Advanced Ship Engineering Research Center, Pusan National Univeristy, Busan 609-735, Korea

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The basic electrodeposition characteristics for the fabrication of Tl, Pb, Bi, Sr, Ba, Ca, Cu (Tl-1223) precursor films in dimethyl sulfoxide (DMSO) were investigated by using the electrochemical method as a cathodic polarization and a chronamperometric technique. Potential differences of ca. -0.2 V were observed in non-aqueous solution, compared with the electromotive force (EMF) series calculated from an aqueous solution. The deposition behavior was divided into two groups [Tl, Pb, Bi, Cu (TPBC) and Sr, Ba, Ca (SBC)], to investigate the morphologies and nucleation mechanisms suggested by the Scharifker and Hills model. The nucleation mechanism of Tl deviated from the instantaneous and progressive curves, depositing dendrite deposits, while Sr fit the instantaneous curve, depositing hemispherical and spherical geometries; the amount of material deposited was influenced by the deposition time. At the early stage, Sr compressed the growth of Tldeposited dendrite shapes, showing a low Tl:Sr ratio. After 200 s, the Tl:Sr ratio also decreased, creating a new nucleation growth on the deposited particles, which increased the growth rate of the powdery layer while the compact layer was decreasing. Four desired stoichiometric precursor films were obtained in the sequence of one batch of eletrolyte, depositing the seven elements at almost the same growth rates as the time increased.

Keywords:electrodeposition;Tl-1223 coated conductor;dimethyl sulfoxide (DMSO);nucleation mechanism

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[2] Cavallotti PL, Bozzini B, Nobili L, Zangari G, Electrochim. Acta, 39(8-9), 1123 (1994)

[3] Li GR, Tong YX, Liu GK, J. Electroanal. Chem., 562(2), 223 (2004)

[4] Deluca JA, Karas PL, Tkaczyk JE, Bednarczyk PJ, Garbauskas MF, Briant CL, Sorenson DB, Physica C, 21, 205 (1993)

[5] Kamo T, Doi T, Soeta A, Yuasa T, Inoue N, Aihara K, Matsuda S, Appl. Phys. Lett., 59, 3186 (1991)

[6] Sasoaka T, Nomoto A, Seido M, Yuasa T, Inoue N, Aihara K, Kamo T, Jpn. J. Appl. Phys., 30, L1868 (1991)

[7] Matuda SP, Doi T, Soeta A, Yuasa T, Ionue N, Aihara K, Kamo T, Appl. Phys. Lett., 59, 3186 (1991)

[8] Mittag M, Roseberg M, Himmerich B, Sabrowsky H, Supercond. Sci. Technol., 4, 244 (1991)

[9] Bellingeri E, Suo HL, Genoud JY, Schindl M, Walker E, Fkiger R, App. Supercond., 11, 3122 (2001)

[10] Bhattacharya RN, Noufi R, Roybal LL, Ahrenkiel RK, Parilla P, Mason A, Albin D, Science and Technology of Thin Film Superconductors, 2, 243 (1991)

[11] Parilla PA, Carlson CM, Wang YT, Bhattacharya RN, Blaughter RD, Ginley DS, Paranthaman M, Goyal A, Christen DK, Kroeger DM, Appl. Supercond, 9, 1673 (1999)

[12] Bhattacharya RN, Paranthaman M, Physica C, 251, 105 (1995)

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[15] Chen ZF, Li J, Wang EK, J. Electroanal. Chem., 373(1-2), 83 (1994)

[16] Zurawski DJ, Kulesza PJ, Wieckowski A, J. Electrochem. Soc., 135, 1607 (1988)

[17] Hu H, Cline RS, Goodman SR, J. Appl. Phys., 32, 1392 (1961)

[18] Bard AJ, Faulkner LF, Electrochemical Methods, Fundamentals and Applications., 2nd Edn., pp. 91

[19] Schlesinger M, Paunovic M, Modern Electroplating., 4th Edn., Wiley, New York (2000) pp, ix and 461

[20] Grujicic D, Pesic B, Electrochim. Acta, 47(18), 2901 (2002)

[21] Hills GJ, Schiffrim DJ, Thompson J, Electrochim. Acta, 19, 657 (1974)