Multilayer thin film coatings were prepared on silicon substrates. Poly(vinyl alcohol) was adsorbed from aqueous solution to propyldimethylsilyl-modified silicon wafers. This thin semicrystalline coating was chemically modified using acid chlorides to form thicker, hydrophobic coatings. The products of the modification reactions allowed adsorption of a subsequent layer of poly(vinyl alcohol) that could subsequently be hydrophobized. This two-step process (adsorption/chemical modification) allows layer-by-layer deposition to prepare coatings with thickness, chemical structure, and wettability control.