This work studies the relationship between the deposition process parameters and the properties of sputtered c-axis-oriented aluminum nitride (AIN) thin films. AIN films were deposited on a Pt electrode by reactive magnetron sputtering under various deposition conditions. The films were characterized by X-ray diffraction (XRD) and field-emission scanning electron microscopy (FESEM). A polycrystalline AIN film with highly c-axis-preferred orientation was achieved. The XRD rocking curve was 2.7 degrees. The FESEM photographs also show that the AIN film has a dense hexagonal surface texture with uniform grain size and a highly ordered column structure. (c) 2007 Elsevier B.V. All rights reserved.