화학공학소재연구정보센터
Chemistry Letters, Vol.29, No.4, 388-389, 2000
Oscillatory circulation of copper particles during silver-displacement plating in a high magnetic field
Motion of copper particles during silver-displacement plating in a high magnetic field was investigated. Immediately after injecting a silver nitrate solution to a vessel filled with copper powder and suspending the powder in the solution, the particles start to circulate along a vessel under a vertical magnetic field with suddenly changing their directions. The velocity of the motion increased with the magnetic field strength though the deposition rate remained constant.