Chemistry Letters, Vol.31, No.2, 208-209, 2002
Formation of organic monolayer on a hydrogen terminated Si(111) surface via silicon-carbon bond monitored by ATR FT-IR and SFG spectroscopy: Effect of orientational order on the reaction rate
The formation of an octadecyl monolayer on a hydrogen terminated Si(111) surface in neat octadecene at 200 degreesC was followed by attenuated total reflectance Fourier transform infrared (ATR FT-IR) and sum frequency generation (SFG) spectroscopy and ellipsometry. Until ca. 60% of the monolayer was formed, the monolayer formation proceeded with simple first-order reaction kinetics and the monolayer was disordered. As the coverage steadily increased, the order of the monolayer became very high and the rate of the monolayer formation became significantly slower.