Chemistry Letters, Vol.31, No.12, 1194-1195, 2002
Alkyl self-assembled monolayer prepared on hydrogen-terminated Si(111) through reduced pressure chemical vapor deposition: Chemical resistivities in HF and NH4F solutions
Hexadecyl self-assembled monolayers have been prepared on hydrogen-terminated Si(111) substrates through reduced pressure chemical vapor deposition. Chemical resistvities to HF and NH4F of SAMs were studied.