화학공학소재연구정보센터
Journal of Molecular Catalysis A-Chemical, Vol.192, No.1-2, 303-306, 2003
Silica-supported poly-gamma-aminopropylsilane Ni2+, Cu2+, Co2+ complexes: efficient catalysts for Heck vinylation reaction
Silica-supported poly-gamma-aminopropylsilane transition metal (Ni2+, Cu2+, Co2+) complexes have been prepared. These catalysts are highly active and stereoselective for Heck vinylation reaction of aryl iodide with olefines at 130-150 degreesC, and can be reused after washing without loss in activity. An induction period of more than 2 h was observed. (C) 2002 Elsevier Science B.V. All rights reserved.