Thin layer polycrystal oxides (amorphous and micro-crystalline) TiO2(Fe2O3, SnO2 and In2O3 . Sn) are prepared by the organometallic chemical vapor deposition (MO-CVD) technique at 300-410 degrees C. Their structures, surface states and photoelectrochemical properties are described by X-ray diffraction (XRD), electron microscopy and three electrode methods. The experiments indicate that these thin layer oxides are suitable for formly transparent conductive coating to serve as photoelectrodes and photocatalysts for splitting of water.