TiN-coated Si3N4 particles were prepared by depositing TiO2 on the Si3N4 surfaces from Ti(O-i-C3H7)(4) solution, the TiO2 being formed by controlled hydrolysis, then subsequently nitrided with NH3 gas. A homogeneous TiO2 coating was achieved by heating a Si3N4 Suspension containing 1.0 vol% H2O with the precursor at 40degreesC. Nitridation successfully produced Si3N4 particles coated with 10-20 nm TiN particles. Spark plasma sintering of these TiN/Si3N4 particles at 1600degreesC yielded composite ceramics with a relative density of 96% at 25 vol% TiN and an electrical resistivity of 10(-3) Omega.cm in compositions of 17.5 and 25 vol% TiN/Si3N4 making these ceramics suitable for electric discharge machining.