Journal of the American Ceramic Society, Vol.86, No.11, 1976-1978, 2003
Formation of titania submicrometer patterns by the combination of synthesis from an aqueous solution and transcription of a resist pattern
A CrN-coated silicon wafer printed with a resist pattern was used as a substrate, and a novel method for forming titania (TiO2) patterns was investigated. A TiO2 thin film formed over the whole surface of the substrate by soaking in a mixed solution of (NH4)(2)TiF6 and B2O3 at room temperature. The resist material then was dissolved off, using acetone, together with the TiO2 formed on it. A minute pattern of the TiO2 thin film, transcribing the resist pattern, formed. The minimum line width of the TiO2 thin film was 300 nm, which was also the minimum line width of the resist pattern.