화학공학소재연구정보센터
Materials Chemistry and Physics, Vol.80, No.2, 466-471, 2003
Wide-gap a-C : H prepared by do glow discharge of CH4: photoluminescence and electroluminescence in the visible region
We report on visible electroluminescence from metal-semiconductor-insulator-semiconductor-metal heterostructures employing a wide-gap insulating amorphous carbon (a-C:H) film. The a-C:H layers were prepared by do glow discharge decomposition of methane (CH4). The electroluminescence is due to combined effects of surface and volume phenomena, namely to the radiative decay of surface plasmons excited at the positively biased electrode, and the radiative recombination of electron-hole pairs across the forbidden gap of the active layer. The surface- and bulk-related emissions are peaked at similar to750 and similar to600 nm, respectively. Thermal annealing of the samples, up to similar to200degreesC, increases significantly the total electroluminescence efficiency, by one order of magnitude, due to an improvement of volume phenomenon in the emission process. (C) 2003 Elsevier Science B.V. All rights reserved.