The influence of different corrosion medium and temperature on the electrical properties of sputtered Cr-Si-Ni resistive films had been comparative studied by means of the relative electrical resistance change (Delta RIR) technique, electrochemical measurements and scanning electron microscopy (SEM). The results showed that the annealed Cr-Si-Ni films in 0.1 M HCl aqueous solution had much excellent corrosion resistance and good long-term reliability than the films in 0.1 M NaOH aqueous solution at 25 and 50 degrees C. The electrochemical measurement results indicated that the surface of the films formed a dense and stable oxidized Si protective layer in acidic and alkaline aqueous solution at 25 degrees C, and that the passive film in acidic environments exhibited much more protective effects on the films than in alkaline environments. Under alkaline environments, the electrical properties of Cr-Si-Ni films became degraded rapidly at 50 degrees C, and the results indicated that the films were not able to form a stable and protective oxide layer at the higher corrosion temperatures. (c) D 2005 Elsevier B.V. All fights reserved.