화학공학소재연구정보센터
Journal of Crystal Growth, Vol.221, 271-275, 2000
AFM measurement of initially grown GaN layer on GaAs substrate
We measured the surface roughness of initially grown GaN layers on GaAs substrates in different precursor supply conditions. The surface morphology changed dramatically at low precursor flow even though the V/III ratio was constant. At low supersaturation, the number of grains decreased and the grain size enlarged. Therefore the surface was too rough to cover the GaAs substrate. A stepping-stone-like morphology occurred in extreme cases. A few cores grew abnormally large grains. Only nitridation occurred when supersaturation was too low to grow a GaN core. To cover the GaAs surface with a thin GaN layer, a fairly large precursor supply was necessary.