We have developed low-pressure metalorganic chemical vapor deposition technology for the growth of novel III-V Sb-based compounds such as InTlSb, InTlAsSb. and InSbSi. The incorporation of Tl and Si is investigated with various characterization techniques. Preliminary infrared photodetectors based on these materials are fabricated and tested. The maximum responsivity of an In0.96Tl0.04Sb photodetector is about 6.64 V/W at 77 K, corresponding to a Johnson-noise-limited detectivity of about 7.64 x 10(8) cm Hz(1/2)/W. Photoresponse of the In0.94Tl0.06Sb photodetector has been extended to 11 mum at 300K. Infrared photoresponse up to 15 mum is achieved from the InTlAsSb alloy at room temperature. We also demonstrate the uncooled InSbBi photodetector operating in the 8-12 mum range. The voltage responsivity at 10.6 mum is about 1.9mV/W at 300K and the corresponding Johnson-noise-limited detectivity is 1.2 x 10(6) cm Hz(1/2)/W. The carrier lifetime is estimated to be 0.7ns.