Journal of Crystal Growth, Vol.221, 503-508, 2000
Critical layer thickness of 1.2-mu m highly strained GaInAs/GaAs quantum wells
In this paper we experimentally determined the critical layer thickness for highly strained 1.2-mum GaInAs/GaAs quantum wells of good crystal quality. The dependence of the critical layer thickness on the indium content indicates that the observed quality degradation is caused by a growth mode transition. This is also supported by transmission electron microscopy measurements. We discuss the possibility of extending the wavelength of highly strained GaInAs/GaAs quantum wells toward 1.3 mum by delaying the growth mode transition. As a first step, a wavelength extension to 1.225 mum is achieved by using the presented technique.
Keywords:GaInAs/GaAs;strained quantum well;metal organic vapor-phase epitaxy (MOVPE);critical thickness;growth mode transition