A multi-step DC-sputtering deposition technique was studied to obtain c-axis-oriented YBa2Cu3O7-x, (YBCO) thick films. The YBCO thick films were deposited on MgO substrates by DC-sputtering. a-axis-oriented grains in the c-axis YBCO matrix were measured and observed by X-ray diffraction (XRD) and transmission electron microscopy (TEM). The surface resistance (R-s) of the YBCO films measured by dielectric resonance method increases with increasing the film thickness, when the film thickness was above 500 nm. Simultaneously, the LI-axis-oriented grains were observed in the films when the thickness was above 500 nm. However. the a-axis-oriented grains disappeared in the 720 nm-thick YBCO films that were deposited by multi-step depositions. Measured R-s was lower than 0.2 m Omega at 12 GHz, and 70 K. This is about 25% lower than that of the same thickness YBCO films deposited continuously.