Journal of Crystal Growth, Vol.223, No.4, 456-460, 2001
Study of quaternary GaInAsSb alloy by scanning transmission electron microscopy
Quaternary GaInAsSb epilayer was grown by MOCVD on GaSb substrate, and the crystalline state and mismatch relaxation are studied by scanning transmission electron microscopy (STEM), bright field images and convergent beam electron diffraction (CBED) patterns. Mismatch dislocations are generated from the interface, and Lomer 90 degrees dislocations induce surface ridges, and the shift of Kikuchi lines can determine relaxation quantitatively which is similar to the value calculated from electron probe microanalysis.
Keywords:characterization;crystal structure;defects;metalorganic vapor phase epitaxy;semiconducting III-V materials;heterojunction semiconductor devices